Quorum Technologies own the Polaron brand and in early 2006 they also purchased Emitech. ProSciTech is now the sole distributor for these three brands in Australasia, south of Singapore. In time, the instrument range may be rationalised, but at present all competing products of these brands are available and featured on our site. Some additional data may be available from www.quorumtech.com.
Warranty:
Quorum Technologies offer a standard 12 months warranty on all instruments. This can be extended to 3 years by filling in and returning the registration form. Pumps are excluded from the extension.
Operating Principle: The plasma process is accomplished through the use of a low pressure, RF induced, gaseous discharge. The specimen is loaded into the reaction chamber and the chamber is evacuated to a vacuum pressure of 0.1 2.2 torr. A carrier gas is then introduced into the chamber, raising the chamber pressure to 0.3 1.2 torr, depending on the application.
RF power is applied around the chamber. This excites the carrier gas molecules and dissociates it into chemically active atoms and molecules. The mechanism employed in this process is one of ionization. The combustion products, which are completely dissociated and harmless, are carried away in the gas stream. The unique property of this process is that it occurs at relatively low temperatures without employing toxic chemicals.
PLASMA UNIT WITH RF GENERATOR - EMITECH K1050X
The K1050X Plasma Treatment Unit consists of a solid state RF generator and associated tuning circuits, dual process gas flow monitoring needle valve control and full or restricted vent control.
It has a cylindrical Chamber with a rack out drawer system for ease of sample loading.
The vacuum system is a Dual stage separate Rotary Vacuum Pump or Optional Turbo Pump backed by Diaphragm Pump.
The rack out drawer system can be exchanged for a vacuum loading port, for special cleaning applications in SEM/TEM.
This usually employs an Oxygen/Argon mix of gases, the Oxygen removing the organic material (hydrocarbons) and the Argon giving a surface etching of the sample.
Applications:
Features:
Advantages:
Specification of the K1050X Plasma Unit:
Optional Accessories
K1050X Plasma unit with RF generator inquire
K1050T Plasma unit with RF generator, turbo pump inquire
The K1050X Plasma Treatment Unit consists of a solid state RF generator and associated tuning circuits, dual process gas flow monitoring needle valve control and full or restricted vent control.
It has a cylindrical Chamber with a rack out drawer system for ease of sample loading.
The vacuum system is a Dual stage separate Rotary Vacuum Pump or Optional Turbo Pump backed by Diaphragm Pump.
The rack out drawer system can be exchanged for a vacuum loading port, for special cleaning applications in SEM/TEM.
This usually employs an Oxygen/Argon mix of gases, the Oxygen removing the organic material (hydrocarbons) and the Argon giving a surface etching of the sample.
Applications:
- Asbestos sample preparation
- Microincineration of organic material
- Etching of organic samples for SEM & TEM work
- Removal of Photoresist and electronc component encapsulations
- Surface treatment of plastics
- Cleaning of SEM/TEM sample holders
Features:
- Solid State RF Generator and associated tuning circuits
- Fully Automatic Control
- Rack out drawer
- Dual process gas flow
- Compact bench-top system
Advantages:
- Low temperature ashing process
- Easy to operate
- Easy loading/removal of samples
- Can select a mixture of gases
- Space saving
Specification of the K1050X Plasma Unit:
- Instrument Case: 450mm W x 350mm D x 300mm H.
- Barrel Work Chamber: 'Pyrex' 160mm L x 110mm Dia. (Borosilicate Glass as standard.)
- Rack Out Drawer: Sliding Draw Assembly with Sample Holder Tray.
- Plasma Output: RF Power Supply - Solid state 150 Watts RF Peak, Normal operating Range 25 to 75 Watts @ 13.56mhz.
- (Note: The frequency used is that allocated by the International Standards CISPR as an allowed 'industrial' frequency.)
- Vacuum Gauge: Active Gauge Head with fully operating vacuum range display (ATM to 1x10-5 mbar. Full scale - normal operating vacuum 0.5mbar to1.0mbar)
- Digital Timer Unit: Displays elapsed time with range select: 99.9Hours. Automatic termination of Ashing Process.
- Dual Gas Flow Gauges: Dual Gas Needle Valve Flow Control, selectable for 1 or 2 or both gasses (calibrated 5 to 100cm3/minute Air @ A.T.P.)
- Weight: 25Kg.
- Supply: 230Volts 50Hz (5 amp max. including. Pump)
- Services: Process Gas at nominal 5 psi, (0.33bar)
- Recommended Vacuum Pump: No. 3 Pump (with a synthetic oil 'Fomblin' for Oxygen or Corrosive Process Gases.) 2m3/Hr
Optional Accessories
- EK3170 - Diaphragm pump MD1 23 L/M
- EK3176 - Fomblinised Rotary pump - Edwards RV3 - 50 L/M
- EK3171 - XDS5 Scroll pump (oil free)
K1050X Plasma unit with RF generator inquire
K1050T Plasma unit with RF generator, turbo pump inquire
K1050X
GLOW DISCHARGE (PLASMA) UNIT for Carbon Film Treatment & Etching - EMITECH K100X
Hydrophilisation
Freshly made carbon support films tend to have a hydrophobic surface which inhibits the spreading of suspensions of particles in negative staining solutions. However, after glow discharge treatment with air, the carbon film is made hydrophilic and negatively charged, thus allowing easy spreading of aqueous suspensions. With subsequent magnesium acetate treatment the surface is made hydrophilic and positively charged.
In addition to glow discharge treatment using air, other process gases may be used to modify surface properties. For example, if alkylamine is used as a process gas, the carbon film surface will become hydrophobic and positively charged. On the other hand, using methanol as a process gas results in the surface becoming hydrophobic and negatively charged.
Such treatments can facilitate the optional absorption of selected biomolecules.
SPECIAL APPLICATION -
Cleaning
TEM Sample & Holders and Column Parts
Very high vacuum TEM performance and contamination are negatively affected by instrument contamination. The most effective means of cleaning EM parts and especially the specimen holder is by plasma ashing treatment. Hydrocarbons and all other volatile substances are 'cracked' during this process and the volatiles are simply pumped away. Polished high vacuum column parts may look good but they can be a contamination problem.
The rackout draw loading door is fitted with an access port for specific TEM holder, this can be readily changed for alternative TEM holders.
The pumping system has an option for turbo pumping backed by a diaphragm pump for a very clean vacuum.
Glow Discharge Summary
Surface Cleaning
In many instances, surfaces need to be completely cleared of contamination films or deposits. This applies particularly to EM components where such deposits impair the maintenance of a clean vacuum system.
A Glow Discharge treatment can be used to clean such components of undesirable residues.
D.C. Glow Discharge
In the DC+ Mode, the Glow Discharge system can draw up 1Kv. This allows high efficiency ion etching of the specimen surface to remove, for example, oxide or resist layers.
Glow Discharge
The polarity of the head can be switched from positive to negative with respect to earth, for carbon film surface treatment or surface etching of metallic specimens.
Specifications of the K100X Glow Discharge Unit:
Services.
Optional Accessories
K100X Glow discharge unit - ask
Hydrophilisation
Freshly made carbon support films tend to have a hydrophobic surface which inhibits the spreading of suspensions of particles in negative staining solutions. However, after glow discharge treatment with air, the carbon film is made hydrophilic and negatively charged, thus allowing easy spreading of aqueous suspensions. With subsequent magnesium acetate treatment the surface is made hydrophilic and positively charged.
In addition to glow discharge treatment using air, other process gases may be used to modify surface properties. For example, if alkylamine is used as a process gas, the carbon film surface will become hydrophobic and positively charged. On the other hand, using methanol as a process gas results in the surface becoming hydrophobic and negatively charged.
Such treatments can facilitate the optional absorption of selected biomolecules.
SPECIAL APPLICATION -
Cleaning
TEM Sample & Holders and Column PartsVery high vacuum TEM performance and contamination are negatively affected by instrument contamination. The most effective means of cleaning EM parts and especially the specimen holder is by plasma ashing treatment. Hydrocarbons and all other volatile substances are 'cracked' during this process and the volatiles are simply pumped away. Polished high vacuum column parts may look good but they can be a contamination problem.
The rackout draw loading door is fitted with an access port for specific TEM holder, this can be readily changed for alternative TEM holders.
The pumping system has an option for turbo pumping backed by a diaphragm pump for a very clean vacuum.
Glow Discharge Summary
| Atmosphere | Surface | Charge |
| Air | Hydrophilic | Negative |
| Air | Hydrophilic | Positive (With subsequent Magnesium Acetate Treatment) |
| Alkylamine | Hydrophobic | Positive |
| Methanol | Hydrophobic | Negative |
Surface Cleaning
In many instances, surfaces need to be completely cleared of contamination films or deposits. This applies particularly to EM components where such deposits impair the maintenance of a clean vacuum system.
A Glow Discharge treatment can be used to clean such components of undesirable residues.
D.C. Glow Discharge
In the DC+ Mode, the Glow Discharge system can draw up 1Kv. This allows high efficiency ion etching of the specimen surface to remove, for example, oxide or resist layers.
Glow Discharge
The polarity of the head can be switched from positive to negative with respect to earth, for carbon film surface treatment or surface etching of metallic specimens.
Specifications of the K100X Glow Discharge Unit:
- Plasma Voltage - 0 - 1000V Variable DC @ 100mA.
- Electrode Polarity - +DC or -DC with Stainless Steel Electrode 60mm Dia.
- Chamber (Glass) - 165mm Dia x 125mm H.
- Safety Shield - Polycarbonate.
- H.T. Vacuum Interlock.
- Needle Valve Bleed Control.
- Instrument Case: - 450mm W x 350mm D x 175mm H.
- Weight: - 18.0Kg.
Services.
- Electrical Supply. - 230V 50 Hz 6 Amp Max Supply.
- Vacuum Pump - No. 5 Pump or similar (Approx. 6m3/Hour) pumping speed. Oil Mist Filter, Vacuum Hose, (Included with Instrument.)
Optional Accessories
- EK3175 - Rotary pump - Edwards RV3 - 50 L/M + basic oil mist filter
- EK3171 - EDS5 Scroll pump
K100X Glow discharge unit - ask
K100X
| 
|
